Deposition and characterization of germanium sulphide glass planar waveguides
Huang, C.C., Hewak, D.W. and Badding, J.V. (2004) Deposition and characterization of germanium sulphide glass planar waveguides. Optics Express, 12, (11), 2501-2505.
Full text not available from this repository.
Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12 µm/hr at 500oC. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5µm to 7µm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093±0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1±0.3 dB/cm.
|Subjects:||Q Science > QC Physics
T Technology > TK Electrical engineering. Electronics Nuclear engineering
|Divisions:||University Structure - Pre August 2011 > Optoelectronics Research Centre
|Date Deposited:||31 Dec 2004|
|Last Modified:||01 Jun 2011 15:58|
|Contributors:||Huang, C.C. (Author)
Hewak, D.W. (Author)
Badding, J.V. (Author)
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
Actions (login required)