Deposition and characterization of germanium sulphide glass planar waveguides


Huang, C.C., Hewak, D.W. and Badding, J.V. (2004) Deposition and characterization of germanium sulphide glass planar waveguides. Optics Express, 12, (11), 2501-2505.

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Description/Abstract

Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12 µm/hr at 500oC. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5µm to 7µm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093±0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1±0.3 dB/cm.

Item Type: Article
Related URLs:
Subjects: Q Science > QC Physics
T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions: University Structure - Pre August 2011 > Optoelectronics Research Centre
Item ID: 13905
Date Deposited: 31 Dec 2004
Last Modified: 01 Jun 2011 15:58
Contributors: Huang, C.C. (Author)
Hewak, D.W. (Author)
Badding, J.V. (Author)
Date: 2004
Status: Published
URI: http://eprints.soton.ac.uk/id/eprint/13905

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