Wave and particle in molecular interference lithography
Juffmann, Thomas, Truppe, Stefan, Geyer, Philipp, Major, András G., Deachapunya, Sarayut, Ulbricht, Hendrik and Arndt, Markus (2009) Wave and particle in molecular interference lithography. Physical Review Letters, 103, (26), p.263601. (doi:10.1103/PhysRevLett.103.263601).
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The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental demonstration of quantum interference lithography with complex molecules. Molecular matter-wave interference patterns are deposited onto a reconstructed Si(111) 7x7 surface and imaged using scanning tunneling microscopy. Thereby both the particle and the quantum wave character of the molecules can be visualized in one and the same image. This new approach to nanolithography therefore also represents a sensitive new detection scheme for quantum interference experiments.
|Digital Object Identifier (DOI):||doi:10.1103/PhysRevLett.103.263601|
|Subjects:||Q Science > QC Physics|
|Divisions:||University Structure - Pre August 2011 > School of Physics and Astronomy
|Date Deposited:||14 Apr 2010 08:37|
|Last Modified:||27 Mar 2014 19:05|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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