Latency effects and periodic structures in light-induced frustrated etching of Fe:doped LiNbO3
Latency effects and periodic structures in light-induced frustrated etching of Fe:doped LiNbO3
Single crystals of z-cut 0.05% Fe:doped lithium niobate (Fe:LiNbO3), have been etched in a mixture of HF and HNO3 acids, under simultaneous illumination from a ~100 mW 488 nm wavelength Ar ion laser light source, focused to power densities of ~50 W cm–2 at the crystal surface exposed to the etchant. Etching is partially inhibited in illuminated regions, and the degree of inhibition shows a systematic latency: sites illuminated early in the etch run resist further etching even after the light is removed. Etched structures additionally exhibit regular periodic features of ~0.5 µm scale length. Details of these structures are shown, and the latent etching effect is discussed.
2792-2794
Boyland, Alexander J.
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Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Barry, Ian E.
9d4dcd2f-f421-480a-a470-c78722995106
Eason, Robert W.
e38684c3-d18c-41b9-a4aa-def67283b020
Kaczmarek, Malgosia
408ec59b-8dba-41c1-89d0-af846d1bf327
2000
Boyland, Alexander J.
e6e842e6-0fe6-4de2-a9b8-ca44f30ab4d5
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Barry, Ian E.
9d4dcd2f-f421-480a-a470-c78722995106
Eason, Robert W.
e38684c3-d18c-41b9-a4aa-def67283b020
Kaczmarek, Malgosia
408ec59b-8dba-41c1-89d0-af846d1bf327
Boyland, Alexander J., Mailis, Sakellaris, Barry, Ian E., Eason, Robert W. and Kaczmarek, Malgosia
(2000)
Latency effects and periodic structures in light-induced frustrated etching of Fe:doped LiNbO3.
Applied Physics Letters, 77 (18), .
(doi:10.1063/1.1320850).
Abstract
Single crystals of z-cut 0.05% Fe:doped lithium niobate (Fe:LiNbO3), have been etched in a mixture of HF and HNO3 acids, under simultaneous illumination from a ~100 mW 488 nm wavelength Ar ion laser light source, focused to power densities of ~50 W cm–2 at the crystal surface exposed to the etchant. Etching is partially inhibited in illuminated regions, and the degree of inhibition shows a systematic latency: sites illuminated early in the etch run resist further etching even after the light is removed. Etched structures additionally exhibit regular periodic features of ~0.5 µm scale length. Details of these structures are shown, and the latent etching effect is discussed.
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Published date: 2000
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Local EPrints ID: 15141
URI: http://eprints.soton.ac.uk/id/eprint/15141
ISSN: 0003-6951
PURE UUID: 84cee57b-8132-4bee-a828-51583cce2266
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Date deposited: 17 Mar 2005
Last modified: 16 Mar 2024 02:38
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Author:
Alexander J. Boyland
Author:
Sakellaris Mailis
Author:
Ian E. Barry
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