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Zinc selenide optical fibers

Zinc selenide optical fibers
Zinc selenide optical fibers
Semiconductor waveguide fabrication for photonics applications is usually performed in a planar geometry. However, over the past decade a new field of semiconductor-based optical fiber devices has emerged. The drawing of soft chalcogenide semiconductor glasses together with low melting point metals allows for meters-long distributed photoconductive detectors, for example.[1,2] Crystalline unary semiconductors (e.g., Si, Ge) have been chemically deposited at high pressure into silica capillaries,[3,4] allowing the optical and electronic properties of these materials to be exploited for applications such as all-fiber optoelectronics.[5-7] In contrast to planar rib and ridge waveguides with rectilinear cross sections that generally give rise to polarization dependence, the cylindrical fiber waveguides have the advantage of a circular, polarization-independent cross section. Furthermore, the fiber pores, and thus the wires deposited in them, are exceptionally smooth[8] with extremely uniform diameter over their entire length. The high-pressure chemical vapor deposition (HPCVD) technique is simple, low cost, and flexible so that it can be modified to fill a range of capillaries with differing core dimensions, while high production rates can be obtained by parallel fabrication of multiple fibers in a single deposition. It can also be extended to fill the large number of micro- and nanoscale pores in microstructured optical fibers (MOFs), providing additional geometrical design flexibility to enhance the potential application base of the fiber devices.[9] Semiconductor fibers fabricated via HPCVD in silica pores also retain the inherent characteristics of silica fibers, including their robustness and compatibility with existing optical fiber infrastructure, thus presenting considerable advantages over fibers based on multicomponent soft glasses.
ZnSe, optical fibers, high pressure deposition, templated growth
1521-4095
1647-1651
Sparks, Justin R.
68cb6a0c-29ef-4487-8940-557b05b08568
He, Rongrui
d89761c0-6ad3-460b-80a1-154d33763bdb
Healy, Noel
26eec85c-8d12-4f21-a67a-022f8dc2daab
Krishnamurthi, Mahesh
f707c230-29e8-436d-a160-a54f41ae5305
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
Gopalan, Venkatraman
c37ec093-614a-4b1c-a6ec-a5b32f398a58
Badding, John V.
dd484978-a8b8-4d1f-9b9e-b6b33bde9e7b
Sparks, Justin R.
68cb6a0c-29ef-4487-8940-557b05b08568
He, Rongrui
d89761c0-6ad3-460b-80a1-154d33763bdb
Healy, Noel
26eec85c-8d12-4f21-a67a-022f8dc2daab
Krishnamurthi, Mahesh
f707c230-29e8-436d-a160-a54f41ae5305
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
Gopalan, Venkatraman
c37ec093-614a-4b1c-a6ec-a5b32f398a58
Badding, John V.
dd484978-a8b8-4d1f-9b9e-b6b33bde9e7b

Sparks, Justin R., He, Rongrui, Healy, Noel, Krishnamurthi, Mahesh, Peacock, Anna C., Sazio, Pier J.A., Gopalan, Venkatraman and Badding, John V. (2011) Zinc selenide optical fibers. Advanced Materials, 23 (14), 1647-1651. (doi:10.1002/adma.201003214).

Record type: Article

Abstract

Semiconductor waveguide fabrication for photonics applications is usually performed in a planar geometry. However, over the past decade a new field of semiconductor-based optical fiber devices has emerged. The drawing of soft chalcogenide semiconductor glasses together with low melting point metals allows for meters-long distributed photoconductive detectors, for example.[1,2] Crystalline unary semiconductors (e.g., Si, Ge) have been chemically deposited at high pressure into silica capillaries,[3,4] allowing the optical and electronic properties of these materials to be exploited for applications such as all-fiber optoelectronics.[5-7] In contrast to planar rib and ridge waveguides with rectilinear cross sections that generally give rise to polarization dependence, the cylindrical fiber waveguides have the advantage of a circular, polarization-independent cross section. Furthermore, the fiber pores, and thus the wires deposited in them, are exceptionally smooth[8] with extremely uniform diameter over their entire length. The high-pressure chemical vapor deposition (HPCVD) technique is simple, low cost, and flexible so that it can be modified to fill a range of capillaries with differing core dimensions, while high production rates can be obtained by parallel fabrication of multiple fibers in a single deposition. It can also be extended to fill the large number of micro- and nanoscale pores in microstructured optical fibers (MOFs), providing additional geometrical design flexibility to enhance the potential application base of the fiber devices.[9] Semiconductor fibers fabricated via HPCVD in silica pores also retain the inherent characteristics of silica fibers, including their robustness and compatibility with existing optical fiber infrastructure, thus presenting considerable advantages over fibers based on multicomponent soft glasses.

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More information

Published date: 12 April 2011
Keywords: ZnSe, optical fibers, high pressure deposition, templated growth
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 180775
URI: http://eprints.soton.ac.uk/id/eprint/180775
ISSN: 1521-4095
PURE UUID: df313659-a4f7-4235-9c59-20f7c80a9c70
ORCID for Anna C. Peacock: ORCID iD orcid.org/0000-0002-1940-7172
ORCID for Pier J.A. Sazio: ORCID iD orcid.org/0000-0002-6506-9266

Catalogue record

Date deposited: 13 Apr 2011 11:25
Last modified: 15 Mar 2024 03:15

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Contributors

Author: Justin R. Sparks
Author: Rongrui He
Author: Noel Healy
Author: Mahesh Krishnamurthi
Author: Anna C. Peacock ORCID iD
Author: Pier J.A. Sazio ORCID iD
Author: Venkatraman Gopalan
Author: John V. Badding

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