Photolysis of (Me2Si)(6) in argon matrices doped with high concentrations (ca. 20%) of N2O or C2H4O: formation of (Me2SiO)(6)


Almond, M. J., Cannady, J. P., Darling, T. A., Ogden, J. S. and Walsh, R. (2001) Photolysis of (Me2Si)(6) in argon matrices doped with high concentrations (ca. 20%) of N2O or C2H4O: formation of (Me2SiO)(6). Journal of Organometallic Chemistry, 640, (1-2), 177-181. (doi:10.1016/S0022-328X(01)01184-6).

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Description/Abstract

Irradiation using a low pressure mercury lamp (lambda =ca. 250 nm) of argon matrices containing ca. 1% (Me2Si)(6) and ca. 20% ethylene oxide (C2H4O) or nitrous oxide (N2O) for a period of ca. 20 h leads to the formation of the cyclic compound (Me2SiO)(6). This has a 12-membered ring with alternating Si and O atoms. It is identified by comparison of its infrared spectrum with a spectrum of an authentic sample. The reaction appears to proceed by stepwise insertion of O atoms into Si-Si bonds.

Item Type: Article
Related URLs:
Keywords: photolysis, matrix isolation, (me2si)(6), oxidation isolated dimethylsilylene, dodecamethylcyclohexasilane, photooxidation, 1-methylsilene
Subjects: Q Science
Q Science > QD Chemistry
Divisions: University Structure - Pre August 2011 > School of Chemistry
ePrint ID: 19378
Date Deposited: 13 Feb 2006
Last Modified: 27 Mar 2014 18:09
URI: http://eprints.soton.ac.uk/id/eprint/19378

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