Optical and electrical properties of W-O-N coatings deposited by DC reactive sputtering
Parreira, Nuno M. G., Polcar, Tomas, Martin, Nicolas, Banakh, Oksana and Cavaleiro, Albano (2007) Optical and electrical properties of W-O-N coatings deposited by DC reactive sputtering. Plasma Processes and Polymers, 4, (S1), S69-S75. (doi:10.1002/ppap.200730405).
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Tungsten oxynitride films (W-O-N) were prepared by DC reactive magnetron sputtering in a wide range of compositions from tungsten nitride (WN) to tungsten oxide (WO3), by changing the oxygen and nitrogen flows, fO2 and fN2, respectively. The total pressure was 0.3 Pa and the (p + p)/pAr ratio was kept constant at 1:1. The coatings were characterized concerning the chemical composition, structure, electrical, and optical properties by electron probe microanalysis, X-ray diffraction, four-point probe, and ellipsometry, respectively. A linear increase in the oxygen content was observed as a function of the increasing O2 flux. The composition will influence the structure and the electrical and optical properties of the coatings.
|Subjects:||Q Science > QC Physics|
|Divisions:||Faculty of Engineering and the Environment > Engineering Sciences > n CATS Research Group
|Date Deposited:||20 Oct 2011 13:01|
|Last Modified:||20 Oct 2011 13:01|
|Contributors:||Parreira, Nuno M. G. (Author)
Polcar, Tomas (Author)
Martin, Nicolas (Author)
Banakh, Oksana (Author)
Cavaleiro, Albano (Author)
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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