Confined high-pressure chemical deposition of hydrogenated amorphous silicon


Baril, Neil F., He, Rongrui, Day, Todd D., Sparks, Justin R., Keshavarzi, Banafsheh, Krishnamurthi, Mahesh, Borhan, Ali, Gopalan, Venkatraman, Peacock, Anna C., Healy, Noel, Sazio, Pier J. A. and Badding, John V. (2012) Confined high-pressure chemical deposition of hydrogenated amorphous silicon. Journal of the American Chemical Society, 134, (1), 19-22. (doi:10.1021/ja2067862).

Download

Full text not available from this repository.

Description/Abstract

Hydrogenated amorphous silicon (a-Si:H) is one of the most technologically important semi-conductors. The challenge in producing it from SiH4 precursor is to overcome a significant kinetic barrier to decomposition at a low enough temperature to allow for hydrogen incorporation into a deposited film. The use of high precursor concentrations is one possible means to increase reaction rates at low enough temperatures, but in conventional reactors such an approach produces large numbers of homogeneously nucleated particles in the gas phase, rather than the desired heterogeneous deposition on a surface. We report that deposition in confined micro-/nanoreactors overcomes this difficulty, allowing for the use of silane concentrations many orders of magnitude higher than conventionally employed while still realizing well-developed films. a-Si:H micro-/nanowires can be deposited in this way in extreme aspect ratio, small- diameter optical fiber capillary templates. The semi- conductor materials deposited have ~0.5 atom% hydrogen with passivated dangling bonds and good electronic properties. They should be suitable for a wide range of photonic and electronic applications such as nonlinear optical fibers and solar cells

Item Type: Article
ISSNs: 0002-7863 (print)
1520-5126 (electronic)
Related URLs:
Subjects: Q Science > QC Physics
Q Science > QD Chemistry
Divisions: Faculty of Physical Sciences and Engineering > Optoelectronics Research Centre
ePrint ID: 209063
Date Deposited: 25 Jan 2012 14:36
Last Modified: 27 Mar 2014 19:50
Research Funder: EPSRC
Projects:
Tapered Semiconductor Fibres for Nonlinear Photonics Applications
Funded by: EPSRC (EP/J004863/1)
Led by: Anna Peacock
1 May 2012 to 30 April 2015
NSF Materials World Network: Semiconductor photonic materials inside microstructured optical fibers
Funded by: EPSRC (EP/I035307/1)
Led by: Pier Sazio
1 January 2012 to 31 December 2014
Fiberized Silicon: A New Platform for Nonlinear Photonics Devices
Funded by: EPSRC (EP/G051755/1)
Led by: Anna Peacock
1 January 2010 to 31 December 2012
URI: http://eprints.soton.ac.uk/id/eprint/209063

Actions (login required)

View Item View Item