Diffusion studies of antimony and boron in Si and SiGe under point defect injections by Rapid Thermal Anneal


Dan, A.H., Willoughby, A.F.W., Bonar, J.M. and McGregor, B.M. (2001) Diffusion studies of antimony and boron in Si and SiGe under point defect injections by Rapid Thermal Anneal. In, Proceedings of the Seventh Postgraduate Conference in Engineering Materials, Southampton, UK, 2000. Southampton, UK, University of Southampton2pp, 17-18.

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Description/Abstract

The effect of point defect injection on the diffusion of antimony and boron in silicon and silicon-germanium alloys has been studied by comparison of inert with injection diffusions. In this work, Sb and B in Si were used as control wafers to investigate Sb and B diffusion behavior in Si0.9Ge0.1. The point defect injection technique was carried out by rapid thermal annealing (RTA) Sb and B in Si and Si0.9Ge0.1 samples with the various surface coatings in either oxygen or ammonia atmospheres to inject either interstitial or vacancy defects. The diffusion profiles for as-grown and RTA annealed samples were measured by Secondary Ion Mass Spectrometry (SIMS). Diffusivities for B in Si and Si0.9Ge0.1 were obtained using computer simulations of the measured boron profiles for their annealed samples. Sb diffusion in Si and Si0.9Ge0.1 was found enhanced by vacancy injection and retarded by interstitial injection. The enhanced B diffusion in Si and Si0.9Ge0.1 was found by interstitial injection. These results confirm that Sb diffusion in Si0.9Ge0.1 is primarily dominated by vacancy-mediated mechanism, while B diffuses in Si0.9Ge0.1 by an interstitially mediated mechanism.

Item Type: Conference or Workshop Item (Paper)
Related URLs:
Subjects: T Technology > TJ Mechanical engineering and machinery
Q Science > QA Mathematics > QA75 Electronic computers. Computer science
Q Science > QD Chemistry
Divisions: University Structure - Pre August 2011 > School of Engineering Sciences
University Structure - Pre August 2011 > School of Electronics and Computer Science
ePrint ID: 21792
Date Deposited: 28 Mar 2006
Last Modified: 27 Mar 2014 18:11
Publisher: University of Southampton
URI: http://eprints.soton.ac.uk/id/eprint/21792

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