Test structures for CD and overlay metrology on alternating aperture phase-shifting masks
Test structures for CD and overlay metrology on alternating aperture phase-shifting masks
The ability to test and characterise advanced photomasks for verification and process control is increasingly important and this paper builds on previous work in this area. Atomic force and scanning electron microscope measurements are used to explain anomalies in previously presented results. In addition, a new test structure has been developed to measure an important parameter in alternating aperture phase shifting masks: the alignment between the chrome blocking features and the phase shifting regions etched into the quartz substrate. Simulation results are presented which demonstrate the capability of the test structure when used in a progressional offset array.
0780382625
29-34
Smith, S.
8904521d-3b46-4112-8566-e08de3e011a5
McCallum, M.
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Walton, A.J.
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Stevenson, J.T.M.
a85677f7-e10a-45ca-93ab-bf267626aa36
Harris, P.D.S.
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Ross, A.W.S.
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Hourd, A.C.
238c146d-be4e-47fe-be00-9ca3784e4d3b
Jiang, L.
374f2414-51f0-418f-a316-e7db0d6dc4d1
6 July 2004
Smith, S.
8904521d-3b46-4112-8566-e08de3e011a5
McCallum, M.
5b9a74e0-a30a-4fe5-90b0-085dcf1fa9e2
Walton, A.J.
2ac47979-cc42-4acd-9828-ead8a7897e85
Stevenson, J.T.M.
a85677f7-e10a-45ca-93ab-bf267626aa36
Harris, P.D.S.
5f2170d7-4a2e-4169-9250-44f0109564ef
Ross, A.W.S.
f717a572-f6fe-4412-9682-8fbc80a4fbf1
Hourd, A.C.
238c146d-be4e-47fe-be00-9ca3784e4d3b
Jiang, L.
374f2414-51f0-418f-a316-e7db0d6dc4d1
Smith, S., McCallum, M., Walton, A.J., Stevenson, J.T.M., Harris, P.D.S., Ross, A.W.S., Hourd, A.C. and Jiang, L.
(2004)
Test structures for CD and overlay metrology on alternating aperture phase-shifting masks.
In The International Conference on Microelectronic Test Structures, 2004. Proceedings. ICMTS '04.
IEEE.
.
(doi:10.1109/ICMTS.2004.1309296).
Record type:
Conference or Workshop Item
(Paper)
Abstract
The ability to test and characterise advanced photomasks for verification and process control is increasingly important and this paper builds on previous work in this area. Atomic force and scanning electron microscope measurements are used to explain anomalies in previously presented results. In addition, a new test structure has been developed to measure an important parameter in alternating aperture phase shifting masks: the alignment between the chrome blocking features and the phase shifting regions etched into the quartz substrate. Simulation results are presented which demonstrate the capability of the test structure when used in a progressional offset array.
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Published date: 6 July 2004
Venue - Dates:
The International Conference on Microelectronic Test Structures (ICMTS '04), 2004-03-22 - 2004-03-25
Organisations:
Engineering Sciences
Identifiers
Local EPrints ID: 23541
URI: http://eprints.soton.ac.uk/id/eprint/23541
ISBN: 0780382625
PURE UUID: 1bf77d49-f0ed-4994-ab11-adf638f8eab9
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Date deposited: 25 Jul 2008
Last modified: 16 Mar 2024 03:47
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Contributors
Author:
S. Smith
Author:
M. McCallum
Author:
A.J. Walton
Author:
J.T.M. Stevenson
Author:
P.D.S. Harris
Author:
A.W.S. Ross
Author:
A.C. Hourd
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