Plank, N.O.V., Jiang, Liudi, Gundlach, A.M. and Cheung, R. (2002) The effect of plasma etching on the electrical characteristics of 4H-SiC Schottky diodes. Bergman, Peder and Janzén, Erik (eds.) In Silicon Carbide and Related Materials - 2002. Trans Tech Publications Ltd. pp. 689-692 .
Record type:
Conference or Workshop Item
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Published date: 2002
Additional Information:
Series ISSN 0255-5476. Conference paper: MoP3-16
Venue - Dates:
ECSERM 2002: 4th European Conference on Silicon Carbide and Related Materials, Linköping, Sweden, 2002-09-01 - 2002-09-05
Related URLs:
Identifiers
Local EPrints ID: 23549
URI: http://eprints.soton.ac.uk/id/eprint/23549
ISBN: 0878499202
PURE UUID: c448ec3b-cd10-466a-ab26-736973911f9e
Catalogue record
Date deposited: 05 Jun 2006
Last modified: 07 Dec 2023 18:00
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Contributors
Author:
N.O.V. Plank
Author:
Liudi Jiang
Author:
A.M. Gundlach
Author:
R. Cheung
Editor:
Peder Bergman
Editor:
Erik Janzén
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