Selective and non-selective growth of self-aligned SiGe HBT structures by LPCVD epitaxy


Bonar, J M, Schiz, J and Ashburn, P (1999) Selective and non-selective growth of self-aligned SiGe HBT structures by LPCVD epitaxy. Journal of Materials Science: Materials in Electronics, 10, 345-349.

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Item Type: Article
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
Item ID: 250912
Date Deposited: 01 Oct 1999
Last Modified: 02 Mar 2012 12:38
Contributors: Bonar, J M (Author)
Schiz, J (Author)
Ashburn, P (Author)
Date: 1999
Status: Published
Further Information:Google Scholar
ISI Citation Count:6
URI: http://eprints.soton.ac.uk/id/eprint/250912

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