Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces


Bonar, J M, Schiz, J and Ashburn, P (1997) Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces. Proceedings of Microscopy of Semiconducting Materials Conference , 407-410.

Download

Full text not available from this repository.

Item Type: Conference or Workshop Item (UNSPECIFIED)
ISBNs: 0750304642
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 250927
Date :
Date Event
1997Published
Date Deposited: 01 Oct 1999
Last Modified: 31 Mar 2016 13:51
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/250927

Actions (login required)

View Item View Item