Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces
Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces
0-7503-0464-2
407-410
Bonar, J M
5ee6b25a-3e67-4a6d-9854-5e1e079d50b8
Schiz, J
d29b4f9e-f87d-445a-962b-db8de79f45a1
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
1997
Bonar, J M
5ee6b25a-3e67-4a6d-9854-5e1e079d50b8
Schiz, J
d29b4f9e-f87d-445a-962b-db8de79f45a1
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Bonar, J M, Schiz, J and Ashburn, P
(1997)
Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces.
Proceedings of Microscopy of Semiconducting Materials Conference.
.
Record type:
Conference or Workshop Item
(Other)
This record has no associated files available for download.
More information
Published date: 1997
Venue - Dates:
Proceedings of Microscopy of Semiconducting Materials Conference, 1997-01-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 250927
URI: http://eprints.soton.ac.uk/id/eprint/250927
ISBN: 0-7503-0464-2
PURE UUID: 6308fcd1-1cb9-4480-9e97-49a93d7aa096
Catalogue record
Date deposited: 01 Oct 1999
Last modified: 10 Dec 2021 20:19
Export record
Contributors
Author:
J M Bonar
Author:
J Schiz
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.
View more statistics