Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces
Bonar, J M, Schiz, J and Ashburn, P (1997) Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces. Proceedings of Microscopy of Semiconducting Materials Conference , 407-410.
Download
Full text not available from this repository.
| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
|---|---|
| ISBNs: | 0750304642 |
| Divisions: | Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO |
| Item ID: | 250927 |
| Date Deposited: | 01 Oct 1999 |
| Last Modified: | 02 Mar 2012 14:01 |
| Contributors: | Bonar, J M (Author) Schiz, J (Author) Ashburn, P (Author) |
| Date: | 1997 |
| Status: | Published |
| Further Information: | Google Scholar |
| ISI Citation Count: | 1 |
| URI: | http://eprints.soton.ac.uk/id/eprint/250927 |
Actions (login required)
 |
View Item |
