The effects of fluorine on the epitaxial regrowth of arsenic doped amorphous silicon and polysilicon and of chlorine on the epitaxial regrowth of arsenic doped polysilicon
Marsh, C D, Moiseiwitsch, N E, Booker, G R and Ashburn, P (1997) The effects of fluorine on the epitaxial regrowth of arsenic doped amorphous silicon and polysilicon and of chlorine on the epitaxial regrowth of arsenic doped polysilicon. Proceedings of Microscopy of Semiconducting Materials Conference Institute of Physics, 411-414.
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| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
|---|---|
| ISBNs: | 0750304642 |
| Divisions: | Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO |
| Item ID: | 250929 |
| Date Deposited: | 01 Oct 1999 |
| Last Modified: | 02 Mar 2012 13:17 |
| Contributors: | Marsh, C D (Author) Moiseiwitsch, N E (Author) Booker, G R (Author) Ashburn, P (Author) |
| Date: | 1997 |
| Status: | Published |
| Publisher: | Institute of Physics |
| Further Information: | Google Scholar |
| ISI Citation Count: | 0 |
| URI: | http://eprints.soton.ac.uk/id/eprint/250929 |
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