The effects of fluorine on the epitaxial regrowth of arsenic doped amorphous silicon and polysilicon and of chlorine on the epitaxial regrowth of arsenic doped polysilicon


Marsh, C D, Moiseiwitsch, N E, Booker, G R and Ashburn, P (1997) The effects of fluorine on the epitaxial regrowth of arsenic doped amorphous silicon and polysilicon and of chlorine on the epitaxial regrowth of arsenic doped polysilicon. Proceedings of Microscopy of Semiconducting Materials Conference Institute of Physics, 411-414.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
ISBNs: 0750304642
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 250929
Date Deposited: 01 Oct 1999
Last Modified: 27 Mar 2014 19:52
Publisher: Institute of Physics
Further Information:Google Scholar
ISI Citation Count:0
URI: http://eprints.soton.ac.uk/id/eprint/250929

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