LPCVD growth of SiGe for device applications

Bonar, J M, Parker, G J, Hamel, J S and Ashburn, P (1994) LPCVD growth of SiGe for device applications.


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Item Type: Other
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 250945
Date Deposited: 04 Oct 1999
Last Modified: 27 Mar 2014 19:52
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/250945

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