LPCVD growth of SiGe for device applications
Bonar, J M, Parker, G J, Hamel, J S and Ashburn, P (1994) LPCVD growth of SiGe for device applications.
Download
Full text not available from this repository.
| Item Type: | Other |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 250945 |
| Date Deposited: | 04 Oct 1999 |
| Last Modified: | 02 Mar 2012 13:17 |
| Contributors: | Bonar, J M (Author) Parker, G J (Author) Hamel, J S (Author) Ashburn, P (Author) |
| Date: | 1994 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/250945 |
Actions (login required)
 |
View Item |
