Modelling of ion implantation in a three layer structures using the method of dose matching


Amaratunga, G A J, Sabine, K A and Evans, A G R (1985) Modelling of ion implantation in a three layer structures using the method of dose matching. Trans.IEEE, ED-32, 1889-1890.

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Item Type: Other
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 250993
Date Deposited: 08 Oct 1999
Last Modified: 27 Mar 2014 19:52
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/250993

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