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Phosphorus diffusion in silicon during rapid thermal annealing

Phosphorus diffusion in silicon during rapid thermal annealing
Phosphorus diffusion in silicon during rapid thermal annealing
Nanu, L
83e56023-b0b1-4b4f-a87b-3bbe8058ecc8
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Nanu, L
83e56023-b0b1-4b4f-a87b-3bbe8058ecc8
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311

Nanu, L and Evans, A G R (1999) Phosphorus diffusion in silicon during rapid thermal annealing.

Record type: Other

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More information

Published date: 11 October 1999
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 251021
URI: http://eprints.soton.ac.uk/id/eprint/251021
PURE UUID: 5dac0125-ee5b-44fe-9ce7-685b93f5168b

Catalogue record

Date deposited: 11 Oct 1999
Last modified: 29 Jan 2020 15:05

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Contributors

Author: L Nanu
Author: A G R Evans

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