Anomalous Electrical deactivation of low concentration rapid thermally annealed arsenic implanted silicon


Altrip, J L and Evans, A G R (1992) Anomalous Electrical deactivation of low concentration rapid thermally annealed arsenic implanted silicon. 19, 367-370.

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Item Type: Other
Additional Information: Proceedings of 22 European Solid State Device Research Conference published in Microelectronic Engineering.
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 251052
Date Deposited: 11 Oct 1999
Last Modified: 27 Mar 2014 19:52
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/251052

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