Thermal annealing of metastable and stable Si/SiGe heterojunction bipolar transistors


Shafi, Z A, Martin, A S R, Ashburn, P, Godfrey, D J, Gibbings, C, Post, I R C, Tuppen, C and Jones, M E (1991) Thermal annealing of metastable and stable Si/SiGe heterojunction bipolar transistors. , 135-138.

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Item Type: Other
Additional Information: Organisation: ESSDERC
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
Item ID: 251195
Date Deposited: 19 Oct 1999
Last Modified: 02 Mar 2012 12:18
Contributors: Shafi, Z A (Author)
Martin, A S R (Author)
Ashburn, P (Author)
Godfrey, D J (Author)
Gibbings, C (Author)
Post, I R C (Author)
Tuppen, C (Author)
Jones, M E (Author)
Date: 1991
Additional Information: Organisation: ESSDERC
Status: Published
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/251195

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