Implantation and diffusion models for arsenic


Amaratunga, G A J, Knee, N, Hart, M J and Evans, A G R (1985) Implantation and diffusion models for arsenic. IEE Colloquium, Simulation of Semiconductor Devices and Processes, London

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Item Type: Other
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 252029
Date Deposited: 30 Nov 1999
Last Modified: 27 Mar 2014 19:53
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/252029

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