Implantation and diffusion models for arsenic

Amaratunga, G A J, Knee, N, Hart, M J and Evans, A G R (1985) Implantation and diffusion models for arsenic. IEE Colloquium, Simulation of Semiconductor Devices and Processes, London


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Item Type: Other
Divisions : Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 252029
Accepted Date and Publication Date:
October 1985Published
Date Deposited: 30 Nov 1999
Last Modified: 27 Mar 2014 19:53
Further Information:Google Scholar

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