A study of diffusion, clustering and defects in As+ and BF2+ implanted silicon during scanning electron beam annealing
Hart, M J, Evans, A G R, Amaratunga, G A J and Altrip, J L (1987) A study of diffusion, clustering and defects in As+ and BF2+ implanted silicon during scanning electron beam annealing. MRS Proc., 92, 27-32.
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|Divisions:||Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
|Date Deposited:||30 Nov 1999|
|Last Modified:||02 Mar 2012 13:18|
|Contributors:||Hart, M J (Author)
Evans, A G R (Author)
Amaratunga, G A J (Author)
Altrip, J L (Author)
|Further Information:||Google Scholar|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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