Hart, M J, Evans, A G R, Altrip, J L and Amaratunga, G A J (1987) Diffusion, clustering and defect assessment of CMOS source drain regions after e-beam annealing.
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Published date: 1987
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252037
URI: http://eprints.soton.ac.uk/id/eprint/252037
PURE UUID: 51871703-c18a-4222-a5b7-a0443d960af8
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Date deposited: 30 Nov 1999
Last modified: 10 Dec 2021 20:24
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Contributors
Author:
M J Hart
Author:
A G R Evans
Author:
J L Altrip
Author:
G A J Amaratunga
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