Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon
Altrip, J L, Evans, A G R, Hart, M J, Amaratunga, G A J and Kijek, M (1988) Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon. UK IT 88 Conference, 398-402.
Download
Full text not available from this repository.
| Item Type: | Other |
|---|---|
| Additional Information: | Address: Swansea |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 252038 |
| Date Deposited: | 30 Nov 1999 |
| Last Modified: | 02 Mar 2012 14:02 |
| Contributors: | Altrip, J L (Author) Evans, A G R (Author) Hart, M J (Author) Amaratunga, G A J (Author) Kijek, M (Author) |
| Date: | July 1988 |
| Additional Information: | Address: Swansea |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/252038 |
Actions (login required)
 |
View Item |
