Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon


Altrip, J L, Evans, A G R, Hart, M J, Amaratunga, G A J and Kijek, M (1988) Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon. UK IT 88 Conference, 398-402.

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Item Type: Other
Additional Information: Address: Swansea
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 252038
Date Deposited: 30 Nov 1999
Last Modified: 27 Mar 2014 19:53
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/252038

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