The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing
Altrip, J L, Evans, A G R, Young, N D and Logan, J R (1991) The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing. Materials Res.Soc.Symp. Proceedings, 224, 49-54.
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| Item Type: | Other |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 252244 |
| Date Deposited: | 07 Jan 2000 |
| Last Modified: | 02 Mar 2012 11:56 |
| Contributors: | Altrip, J L (Author) Evans, A G R (Author) Young, N D (Author) Logan, J R (Author) |
| Date: | 1991 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/252244 |
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