The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing


Altrip, J L, Evans, A G R, Young, N D and Logan, J R (1991) The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing. Materials Res.Soc.Symp. Proceedings, 224, 49-54.

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Item Type: Other
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 252244
Date Deposited: 07 Jan 2000
Last Modified: 27 Mar 2014 19:54
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/252244

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