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The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing

The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing
The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Young, N D
ea8482f7-7f0a-4b9f-87e8-badea7087f96
Logan, J R
e063eb71-9553-4776-b7a6-73a1e2c52003
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Young, N D
ea8482f7-7f0a-4b9f-87e8-badea7087f96
Logan, J R
e063eb71-9553-4776-b7a6-73a1e2c52003

Altrip, J L, Evans, A G R, Young, N D and Logan, J R (1991) The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing.

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More information

Published date: 1991
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 252244
URI: http://eprints.soton.ac.uk/id/eprint/252244
PURE UUID: 111c095f-6efd-442a-99a6-8315300137b5

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Date deposited: 07 Jan 2000
Last modified: 10 Dec 2021 20:26

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Contributors

Author: J L Altrip
Author: A G R Evans
Author: N D Young
Author: J R Logan

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