High aspect Ratio Sub-micron Pillars Fabricated by Photo Assisted Electrochemical Etching and Oxidation


Lau, H W, Parker, G J, Greef, R and Holling, M (1995) High aspect Ratio Sub-micron Pillars Fabricated by Photo Assisted Electrochemical Etching and Oxidation. Applied Physics Letters, 67, (13), 1877 - 1879.

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Item Type: Other
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 252430
Date Deposited: 27 Jan 2000
Last Modified: 27 Mar 2014 19:54
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/252430

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