Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing


Hart, M J, Evans, A G R, Amaratunga, G A J, Altrip, J L and Kijek, M (1987) Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing.

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Description/Abstract

Abstracts pp8-11

Item Type: Other
Additional Information: Alvey Club meeting.
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 252673
Date Deposited: 10 Mar 2000
Last Modified: 27 Mar 2014 19:54
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/252673

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