Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing
Hart, M J, Evans, A G R, Amaratunga, G A J, Altrip, J L and Kijek, M (1987) Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing.
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Description/Abstract
Abstracts pp8-11
| Item Type: | Other |
|---|---|
| Additional Information: | Alvey Club meeting. |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 252673 |
| Date Deposited: | 10 Mar 2000 |
| Last Modified: | 02 Mar 2012 11:37 |
| Contributors: | Hart, M J (Author) Evans, A G R (Author) Amaratunga, G A J (Author) Altrip, J L (Author) Kijek, M (Author) |
| Date: | October 1987 |
| Additional Information: | Alvey Club meeting. |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/252673 |
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