Thick Selective Silicon Epitaxial Growth by LPCVD from Pure Silane


Parker, G J (1990) Thick Selective Silicon Epitaxial Growth by LPCVD from Pure Silane. Semi.Intl., 24 - 26.

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Item Type: Other
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
Item ID: 252964
Date Deposited: 14 Apr 2000
Last Modified: 01 Mar 2012 10:33
Contributors: Parker, G J (Author)
Date: July 1990
Status: Published
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/252964

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