Electrical measurement of silicon film and oxide thickness in partially depleted SOI technologies
Tenbroek, B M, Redman-White, W, Lee, M S L and Uren, M J (1996) Electrical measurement of silicon film and oxide thickness in partially depleted SOI technologies. Solid State Electronics, 39, (7), 1011 - 1014.
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|Divisions:||Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
|Date Deposited:||26 Jul 2000|
|Last Modified:||02 Mar 2012 11:39|
|Contributors:||Tenbroek, B M (Author)
Redman-White, W (Author)
Lee, M S L (Author)
Uren, M J (Author)
|Further Information:||Google Scholar|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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