Electrical measurement of silicon film and oxide thickness in partially depleted SOI technologies


Tenbroek, B M, Redman-White, W, Lee, M S L and Uren, M J (1996) Electrical measurement of silicon film and oxide thickness in partially depleted SOI technologies. Solid State Electronics, 39, (7), 1011 - 1014.

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Item Type: Article
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 253721
Date Deposited: 26 Jul 2000
Last Modified: 27 Mar 2014 19:56
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/253721

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