Electrical measurement of silicon film and oxide thickness in partially depleted SOI technologies
Tenbroek, B M, Redman-White, W, Lee, M S L and Uren, M J (1996) Electrical measurement of silicon film and oxide thickness in partially depleted SOI technologies. Solid State Electronics, 39, (7), 1011 - 1014.
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| Item Type: | Article |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 253721 |
| Date Deposited: | 26 Jul 2000 |
| Last Modified: | 02 Mar 2012 11:39 |
| Contributors: | Tenbroek, B M (Author) Redman-White, W (Author) Lee, M S L (Author) Uren, M J (Author) |
| Date: | July 1996 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/253721 |
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