SiGe heterojunction bipolar transistors on insulator


Ashburn, P., Mubarek, H.A.W.El, Bonar, J.M. and Redman-White, W. (2001) SiGe heterojunction bipolar transistors on insulator. At Electrochemical Society Spring Meeting: Tenth International Symposium on Silicon On Insulator Technology and Devices, Washington , USA, Electrochemical Society, 433-444.

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Description/Abstract

This paper reviews progress in SiGe heterojunction bipolar technology and considers the prospects for SiGe HBT on insulator technology. The three approaches commonly used to produce SiGe HBTs are described and compared, namely the drift SiGe base, the SiGe base with a low doped emitter and the selective SiGe base. Methods for suppressing or avoiding transient enhanced boron diffusion are discussed, especially the use of carbon in the SiGe base. Finally, work on SiGe heterojunction bipolar transistors on SOI at Southampton University is reviewed.

Item Type: Conference or Workshop Item (Speech)
Additional Information: Event Dates: March 2001 Organisation: Electrochemical Society
ISBNs: 1566773091
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
Item ID: 254722
Date Deposited: 05 Jan 2004
Last Modified: 01 Mar 2012 10:42
Contributors: Ashburn, P. (Author)
Mubarek, H.A.W.El (Author)
Bonar, J.M. (Author)
Redman-White, W. (Author)
Date: March 2001
Additional Information: Event Dates: March 2001 Organisation: Electrochemical Society
Status: Published
Publisher: Electrochemical Society
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/254722

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