Design criteria for a hybrid nano/photolithography system
Design criteria for a hybrid nano/photolithography system
Niblock, T
5f3fb4d3-af49-47b7-b6e1-5d100317abb5
Kraft, M
54927621-738f-4d40-af56-a027f686b59f
Sehr, H
49a567aa-b765-4dfa-bb18-4aa5fb3ea7f9
2001
Niblock, T
5f3fb4d3-af49-47b7-b6e1-5d100317abb5
Kraft, M
54927621-738f-4d40-af56-a027f686b59f
Sehr, H
49a567aa-b765-4dfa-bb18-4aa5fb3ea7f9
Niblock, T, Kraft, M and Sehr, H
(2001)
Design criteria for a hybrid nano/photolithography system.
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Published date: 2001
Additional Information:
Proceedings Conference on Micromechancis Europe, Cork, Ireland.
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 256055
URI: http://eprints.soton.ac.uk/id/eprint/256055
PURE UUID: 9e08b2e7-f040-440e-87cf-a06e82f7bef6
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Date deposited: 11 Oct 2001
Last modified: 10 Dec 2021 20:41
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Contributors
Author:
T Niblock
Author:
M Kraft
Author:
H Sehr
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