On optimisation of Nickel electroforming for MEMS applications
Grigore, L, Ensell, GJ, Evans, AGR, Elejalde, N and Lee, S (2002) On optimisation of Nickel electroforming for MEMS applications. In, Micromechanics Europe, Sinaia, Romania, 08 - 06 Oct 2002. , 83-86.
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This paper presents the details of an optimum nickel electroforming process for MEMS applications. Electrochemical deposition of nickel microstructures in thick resist moulds from a standard process using a sulphamate electrlyte gives most of the time poor quality deposits: non uniform, sometimes with pitting and without adherence on the substrate. As in MEMS devices the features to be electroplated are of micron size (which creates a big disproportion in the surface area between the two electrodes involved in the plating bath), an optimisation of the standard electroplating rocess was developed.
|Item Type:||Conference or Workshop Item (Paper)|
|Additional Information:||Event Dates: October 6-8th 2002|
|Keywords:||thick resist mould, sulphamate electroplating bath, nickel microstructures|
|Divisions:||Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
|Date Deposited:||26 Aug 2004|
|Last Modified:||27 Mar 2014 19:59|
|Further Information:||Google Scholar|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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