SiGe pMOSFETs Fabricated on Limited Area SiGe Virtual Substrates


Waite, A M, Straube, U N, Lloyd, N S, Croucher, S G, Tang, Y T, Rong, B, Evans, A G R, Grasby, T J, Whall, T E and Parker, E H C (2002) SiGe pMOSFETs Fabricated on Limited Area SiGe Virtual Substrates. MRS 2002 Fall

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
Item ID: 257809
Date Deposited: 26 Jun 2003
Last Modified: 16 Aug 2012 03:31
Contributors: Waite, A M (Author)
Straube, U N (Author)
Lloyd, N S (Author)
Croucher, S G (Author)
Tang, Y T (Author)
Rong, B (Author)
Evans, A G R (Author)
Grasby, T J (Author)
Whall, T E (Author)
Parker, E H C (Author)
Date: 2002
Status: Published
Further Information:Google Scholar
ISI Citation Count:0
URI: http://eprints.soton.ac.uk/id/eprint/257809

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