Electroplating moulds with different thick photoresists for MEMS applications.
Electroplating moulds with different thick photoresists for MEMS applications.
103-104
Kukharenka, A
1dff90b0-3ae7-489d-ae20-50beca17c89a
Kraft, Michael
c2ff2439-b909-4af3-824d-9d7c0d14dc3e
2002
Kukharenka, A
1dff90b0-3ae7-489d-ae20-50beca17c89a
Kraft, Michael
c2ff2439-b909-4af3-824d-9d7c0d14dc3e
Kukharenka, A and Kraft, Michael
(2002)
Electroplating moulds with different thick photoresists for MEMS applications.
EUROSENSORS XVI, Prague, Czech Republic.
15 - 18 Sep 2002.
.
Record type:
Conference or Workshop Item
(Paper)
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Published date: 2002
Additional Information:
Event Dates: September 2002
Venue - Dates:
EUROSENSORS XVI, Prague, Czech Republic, 2002-09-15 - 2002-09-18
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 257819
URI: http://eprints.soton.ac.uk/id/eprint/257819
PURE UUID: 464a1428-b38a-4226-83e8-b98fb3f81ec4
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Date deposited: 27 Oct 2004
Last modified: 05 Mar 2024 17:57
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Contributors
Author:
A Kukharenka
Author:
Michael Kraft
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