Realisation of electroplating moulds with different thick photoresists for MEMs applications.
Kukharenka, A and Kraft, Michael (2002) Realisation of electroplating moulds with different thick photoresists for MEMs applications. In, 4th International Conference on Material for Microelectronics and Nanoengineering, Espoo, Finland, , 165-168.
Download
Full text not available from this repository.
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Additional Information: | Event Dates: June 2002 |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 257820 |
| Date Deposited: | 27 Oct 2004 |
| Last Modified: | 01 Mar 2012 10:53 |
| Contributors: | Kukharenka, A (Author) Kraft, Michael (Author) |
| Date: | 2002 |
| Additional Information: | Event Dates: June 2002 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/257820 |
Actions (login required)
![]() |
View Item |


