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Realisation of electroplating moulds with different thick photoresists for MEMs applications.

Realisation of electroplating moulds with different thick photoresists for MEMs applications.
Realisation of electroplating moulds with different thick photoresists for MEMs applications.
165-168
Kukharenka, A
1dff90b0-3ae7-489d-ae20-50beca17c89a
Kraft, Michael
c2ff2439-b909-4af3-824d-9d7c0d14dc3e
Kukharenka, A
1dff90b0-3ae7-489d-ae20-50beca17c89a
Kraft, Michael
c2ff2439-b909-4af3-824d-9d7c0d14dc3e

Kukharenka, A and Kraft, Michael (2002) Realisation of electroplating moulds with different thick photoresists for MEMs applications. 4th International Conference on Material for Microelectronics and Nanoengineering, Espoo, Finland. pp. 165-168 .

Record type: Conference or Workshop Item (Paper)

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More information

Published date: 2002
Additional Information: Event Dates: June 2002
Venue - Dates: 4th International Conference on Material for Microelectronics and Nanoengineering, Espoo, Finland, 2002-05-31
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 257820
URI: http://eprints.soton.ac.uk/id/eprint/257820
PURE UUID: 6877ea64-66d4-4f9c-b689-f6cfa1e5d235

Catalogue record

Date deposited: 27 Oct 2004
Last modified: 10 Dec 2021 20:53

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Contributors

Author: A Kukharenka
Author: Michael Kraft

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