Realisation of electroplating moulds with different thick photoresists for MEMs applications.


Kukharenka, A and Kraft, Michael (2002) Realisation of electroplating moulds with different thick photoresists for MEMs applications. In, 4th International Conference on Material for Microelectronics and Nanoengineering, Espoo, Finland, , 165-168.

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Item Type: Conference or Workshop Item (Paper)
Additional Information: Event Dates: June 2002
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 257820
Date Deposited: 27 Oct 2004
Last Modified: 27 Mar 2014 20:00
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/257820

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