Ultra low silicon substrate noise crosstalk using metal Faraday cages in a silicon-on-insulator technology.


Stefanou, S, Hamel, J, Baine, P, Armstrong, M, Gamble, H, Kraft, M and Kemhadjian, H A (2004) Ultra low silicon substrate noise crosstalk using metal Faraday cages in a silicon-on-insulator technology. IEEE Transactions on electron Devices, 51 No., 486-491.

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Item Type: Article
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 259082
Date Deposited: 27 Sep 2004
Last Modified: 27 Mar 2014 20:01
Publisher: IEEE Transactions on Electron Devices
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/259082

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