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Effect of Fluorine Implantation on Boron Diffusion in Metastable Si0.86Ge0.14

Effect of Fluorine Implantation on Boron Diffusion in Metastable Si0.86Ge0.14
Effect of Fluorine Implantation on Boron Diffusion in Metastable Si0.86Ge0.14
El Mubarek, H A W
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Wang, Y
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Bonar, J M
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Hemment, P L F
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Ashburn, P
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El Mubarek, H A W
c4bc6a15-b00e-4b72-84e0-611d3d20fead
Wang, Y
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Bonar, J M
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Hemment, P L F
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Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038

El Mubarek, H A W, Wang, Y, Bonar, J M, Hemment, P L F and Ashburn, P (2004) Effect of Fluorine Implantation on Boron Diffusion in Metastable Si0.86Ge0.14. Material Research Society Symposium C Proceedings, MRS Spring Meeting, San Francisco.

Record type: Article

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More information

Published date: April 2004
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 260246
URI: http://eprints.soton.ac.uk/id/eprint/260246
PURE UUID: fac6d2d9-c317-4d58-8abf-db6af5747b86

Catalogue record

Date deposited: 14 Apr 2005
Last modified: 08 Jan 2022 05:45

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Contributors

Author: H A W El Mubarek
Author: Y Wang
Author: J M Bonar
Author: P L F Hemment
Author: P Ashburn

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