Novel fabrication methods for submicrometer Josephson junction qubits.
Potts, A, Routley, P R, Parker, G J and de Groot, P A J (2001) Novel fabrication methods for submicrometer Josephson junction qubits. Journal of Materials Science : Materials in Electronics, (12), 289-293.
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Description/Abstract
Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al203/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer masks
| Item Type: | Article |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 260364 |
| Date Deposited: | 25 Jan 2005 |
| Last Modified: | 15 Aug 2012 03:13 |
| Contributors: | Potts, A (Author) Routley, P R (Author) Parker, G J (Author) de Groot, P A J (Author) |
| Date: | June 2001 |
| Status: | Published |
| Further Information: | Google Scholar |
| ISI Citation Count: | 1 |
| URI: | http://eprints.soton.ac.uk/id/eprint/260364 |
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