Novel fabrication methods for submicrometer Josephson junction qubits.
Potts, A, Routley, P R, Parker, G J and de Groot, P A J (2001) Novel fabrication methods for submicrometer Josephson junction qubits. Journal of Materials Science : Materials in Electronics, (12), 289-293.
Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al203/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer masks
|Divisions:||Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
|Date Deposited:||25 Jan 2005|
|Last Modified:||15 Aug 2012 03:13|
|Contributors:||Potts, A (Author)
Routley, P R (Author)
Parker, G J (Author)
de Groot, P A J (Author)
|Further Information:||Google Scholar|
|ISI Citation Count:||1|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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