A comparative study of different thick photoresists for MEMS applications
Koukharenko, E., Kraft, M., Ensell, G. and Hollinshead, N. (2005) A comparative study of different thick photoresists for MEMS applications. Journal of Materials Science: Materials in Electronics, 16, (11-12), 741-747.
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| Item Type: | Article |
|---|---|
| ISSNs: | 0957-4522 |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 261723 |
| Date Deposited: | 22 Dec 2005 |
| Last Modified: | 01 Mar 2012 11:13 |
| Contributors: | Koukharenko, E. (Author) Kraft, M. (Author) Ensell, G. (Author) Hollinshead, N. (Author) |
| Date: | November 2005 |
| Status: | Published |
| Further Information: | Google Scholar |
| ISI Citation Count: | 8 |
| URI: | http://eprints.soton.ac.uk/id/eprint/261723 |
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