Gate Capacitance of deep submicron MOSFETS with high-K gate dielectrics

Hakim, MMA and Haque, A (2002) Gate Capacitance of deep submicron MOSFETS with high-K gate dielectrics. At International Conference on Electrical and Computer Engineering (ICECE 2002), Dhaka, Bangladesh, , 312-315.


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We study gate capacitance of deep submicron MOSFETs with high-K gate dielectrics. Schrödinger’s equation is solved by applying an open boundary condition at silicon-gate dielectric interface. Self-consistent numerical results reveal that accounting for wave function penetration into the gate dielectric causes the carrier distribution to be shifted closer to the gate dielectric. This effect increases with increasing gate voltage and also increases with the decreasing conduction band offset of the gate dielectric material with silicon. Gate capacitance calculated from conventional modeling is found to be independent of dielectric materials for a given equivalent oxide thickness (EOT). But our study shows that when wave function penetration into the gate dielectric is considered, gate capacitance for a given EOT increases with a decrease in the conduction band offset. Effects of substrate doping density on gate capacitance are found to be negligible when wave function penetration effects are incorporated.

Item Type: Conference or Workshop Item (Speech)
Divisions : Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 262446
Accepted Date and Publication Date:
Date Deposited: 02 May 2006
Last Modified: 27 Mar 2014 20:05
Further Information:Google Scholar

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