Photoresist patterned thick-film piezoelectric elements on silicon
Photoresist patterned thick-film piezoelectric elements on silicon
A fundamental limitation of screen printing is the achievable alignment accuracy and resolution. This paper presents details of a thick-resist process that improves both of these factors. The technique involves exposing/developing a thick resist to form the desired pattern and then filling the features with thick film material using a doctor blading process. Registration accuracy comparable with standard photolithographic processes has been achieved resulting in minimum feature sizes of <50 ?m and a film thickness of 100 ?m. Piezoelectric elements have been successfully poled on a platinised silicon wafer with a measured d 33 value of 60 pCN?1.
PZT, Doctor Blading, Thick photoresist
327-331
Frood, A. J. M.
bbb8d1b9-96b2-4f75-ab91-e85c4e8da780
Beeby, S. P.
ba565001-2812-4300-89f1-fe5a437ecb0d
Tudor, M. J.
46eea408-2246-4aa0-8b44-86169ed601ff
White, N. M.
c7be4c26-e419-4e5c-9420-09fc02e2ac9c
March 2007
Frood, A. J. M.
bbb8d1b9-96b2-4f75-ab91-e85c4e8da780
Beeby, S. P.
ba565001-2812-4300-89f1-fe5a437ecb0d
Tudor, M. J.
46eea408-2246-4aa0-8b44-86169ed601ff
White, N. M.
c7be4c26-e419-4e5c-9420-09fc02e2ac9c
Frood, A. J. M., Beeby, S. P., Tudor, M. J. and White, N. M.
(2007)
Photoresist patterned thick-film piezoelectric elements on silicon.
Journal of Electroceramics, 19 (4), .
(doi:10.1007/s10832-007-9049-y).
Abstract
A fundamental limitation of screen printing is the achievable alignment accuracy and resolution. This paper presents details of a thick-resist process that improves both of these factors. The technique involves exposing/developing a thick resist to form the desired pattern and then filling the features with thick film material using a doctor blading process. Registration accuracy comparable with standard photolithographic processes has been achieved resulting in minimum feature sizes of <50 ?m and a film thickness of 100 ?m. Piezoelectric elements have been successfully poled on a platinised silicon wafer with a measured d 33 value of 60 pCN?1.
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Published date: March 2007
Keywords:
PZT, Doctor Blading, Thick photoresist
Organisations:
EEE
Identifiers
Local EPrints ID: 263684
URI: http://eprints.soton.ac.uk/id/eprint/263684
ISSN: 1385-3449
PURE UUID: c59145f8-17f9-44de-a581-993a5ebbb86d
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Date deposited: 08 Mar 2007
Last modified: 15 Mar 2024 02:46
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