Camon, H, Rouhanie, M D, Esteve, D, Gue, A M and Moktadir, Z (1995) Atomic scale simulation of silicon anisotropic chemical etching. Microsystem Technologies, 1, 163-167.
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Published date: 1995
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 263814
URI: http://eprints.soton.ac.uk/id/eprint/263814
ISSN: 0946-7076
PURE UUID: e4c23531-c898-4abe-a001-be1c2d571dda
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Date deposited: 30 Mar 2007
Last modified: 10 Dec 2021 21:40
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Contributors
Author:
H Camon
Author:
M D Rouhanie
Author:
D Esteve
Author:
A M Gue
Author:
Z Moktadir
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