Roughness characterization of Si(110) etched in TMAH by Atomic Force Microscopy
Moktadir, Z and Sato, K (1999) Roughness characterization of Si(110) etched in TMAH by Atomic Force Microscopy. In, Materials Research society, Boston MA, USA, , 305-309.
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| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Additional Information: | Event Dates: December 1999 |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 263852 |
| Date Deposited: | 04 Apr 2007 |
| Last Modified: | 02 Mar 2012 12:40 |
| Contributors: | Moktadir, Z (Author) Sato, K (Author) |
| Date: | 1999 |
| Additional Information: | Event Dates: December 1999 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/263852 |
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