AFM current-imaging study for current density through nanocrystalline silicon dots embedded in SiO2
Salem, M. A. , Mizuta, Hiroshi, Oda, S., Fu, Y. and Willander, M. (2005) AFM current-imaging study for current density through nanocrystalline silicon dots embedded in SiO2. Japanese Journal of Applied Physics, 44, L88-L91.
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| Item Type: | Article |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 266195 |
| Date Deposited: | 22 Jul 2008 08:08 |
| Last Modified: | 02 Mar 2012 13:21 |
| Contributors: | Salem, M. A. (Author) Mizuta, Hiroshi (Author) Oda, S. (Author) Fu, Y. (Author) Willander, M. (Author) |
| Date: | 2005 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/266195 |
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