High-speed and Non-volatile Memory Devices Using a Macroscopic Polarized Stack Consisting of Double Floating Gates Interconnected with Engineered Tunnel Oxide Barriers


Tsuchiya, Yoshishige, Kurihara, T., Saito, D., Niikura, H., Mizuta, Hiroshi and Oda, S. (2007) High-speed and Non-volatile Memory Devices Using a Macroscopic Polarized Stack Consisting of Double Floating Gates Interconnected with Engineered Tunnel Oxide Barriers. At IEEE Silicon Nanoelectronics Workshop, Kyoto, , pp 145-146.

Download

[img] PDF
Download (380Kb)
Item Type: Conference or Workshop Item (Poster)
Additional Information: Event Dates: June 2007
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 266282
Date Deposited: 23 Jul 2008 09:43
Last Modified: 27 Mar 2014 20:11
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/266282

Actions (login required)

View Item View Item