Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method
Hippo, D., Kawata, Y., Tsuchiya, Yoshishige, Mizuta, Hiroshi, Oda, S., Urakawa, K. and Koshida, N. (2006) Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method. At Conference on lasers and electro-optics / Quantum electronics and laser science conference, Long Beach, , 114.
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| Item Type: | Conference or Workshop Item (Speech) |
|---|---|
| Additional Information: | Event Dates: May 2006 |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 266298 |
| Date Deposited: | 23 Jul 2008 10:33 |
| Last Modified: | 02 Mar 2012 14:04 |
| Contributors: | Hippo, D. (Author) Kawata, Y. (Author) Tsuchiya, Yoshishige (Author) Mizuta, Hiroshi (Author) Oda, S. (Author) Urakawa, K. (Author) Koshida, N. (Author) |
| Date: | May 2006 |
| Additional Information: | Event Dates: May 2006 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/266298 |
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