Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition
Tsuchiya, Yoshishige, Fujita, H., Mizuta, Hiroshi, Nohira, H., Hattori, T. and Oda, S. (2004) Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition. At 2004 TMS Electronic materials conference and exhibition, Notre Dame, , 30.
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| Item Type: | Conference or Workshop Item (Poster) |
|---|---|
| Additional Information: | Event Dates: June 2004 |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 266335 |
| Date Deposited: | 25 Jul 2008 08:27 |
| Last Modified: | 02 Mar 2012 11:59 |
| Contributors: | Tsuchiya, Yoshishige (Author) Fujita, H. (Author) Mizuta, Hiroshi (Author) Nohira, H. (Author) Hattori, T. (Author) Oda, S. (Author) |
| Date: | June 2004 |
| Additional Information: | Event Dates: June 2004 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/266335 |
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