Electron Energy Loss Behavior in Si Quantum Dots Interconnected with Tunnel Oxide Barriers


Uno, S., Mori, N., Nakazato, K., Koshida, N. and Mizuta, Hiroshi (2004) Electron Energy Loss Behavior in Si Quantum Dots Interconnected with Tunnel Oxide Barriers. At 2004 Silicon Nanoelectronics Workshop, Honolulu, , pp 121-122.

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Item Type: Conference or Workshop Item (Poster)
Additional Information: Event Dates: June 2004
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 266347
Date Deposited: 25 Jul 2008 09:01
Last Modified: 27 Mar 2014 20:11
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/266347

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