Neosilicon-created new applications


Shimada, T., Yamaguchi, S., Ando, M., Nakazato, K., Koshida, N., Takai, K., Tsuchiya, Yoshishige, Mizuta, Hiroshi and Oda, S. (2004) Neosilicon-created new applications. At 7th China-Japan Symposium on Thin Films, Chengdu-Shichuan, , pp 101-104.

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Item Type: Conference or Workshop Item (Speech)
Additional Information: Event Dates: September 2004
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 266389
Date Deposited: 28 Jul 2008 08:56
Last Modified: 27 Mar 2014 20:11
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/266389

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