Neosilicon-created new applications
Shimada, T., Yamaguchi, S., Ando, M., Nakazato, K., Koshida, N., Takai, K., Tsuchiya, Yoshishige, Mizuta, Hiroshi and Oda, S. (2004) Neosilicon-created new applications. At 7th China-Japan Symposium on Thin Films, Chengdu-Shichuan, , pp 101-104.
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| Item Type: | Conference or Workshop Item (Speech) |
|---|---|
| Additional Information: | Event Dates: September 2004 |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 266389 |
| Date Deposited: | 28 Jul 2008 08:56 |
| Last Modified: | 02 Mar 2012 11:40 |
| Contributors: | Shimada, T. (Author) Yamaguchi, S. (Author) Ando, M. (Author) Nakazato, K. (Author) Koshida, N. (Author) Takai, K. (Author) Tsuchiya, Yoshishige (Author) Mizuta, Hiroshi (Author) Oda, S. (Author) |
| Date: | September 2004 |
| Additional Information: | Event Dates: September 2004 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/266389 |
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