Suspended Gate Silicon Nanodots memory


Garcia-Ramirez, Mario A., Yoshimura, Hideo, Tsuchiya, Yoshishige and Mizuta, Hiroshi (2008) Suspended Gate Silicon Nanodots memory. At ESSDERC/CIRC Fringe (ESS-Fringe), Edinburgh, ESSDERC, p19.

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Description/Abstract

This paper proposes a new non-volatile semiconductor memory which features a suspended gate integrated with silicon nanocrystals dots as a floating gate and the MOSFET as a readout. Performing three-dimensional finite element simulations combined with an analytical plate-capacitor model, we clarify the pull-in/pull-out operation of the suspended gate. We also show the dependence of the hysteresis cycle characteristics on material and structural parameters.

Item Type: Conference or Workshop Item (Poster)
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
Item ID: 267426
Date Deposited: 30 May 2009 15:55
Last Modified: 02 Mar 2012 12:22
Contributors: Garcia-Ramirez, Mario A. (Author)
Yoshimura, Hideo (Author)
Tsuchiya, Yoshishige (Author)
Mizuta, Hiroshi (Author)
Date: 15 September 2008
Status: Published
Publisher: ESSDERC
Contact Email Address: magr07r@ecs.soton.ac.uk
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/267426

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