Pulsed-Source MOCVD of High-k Dielectric Thin Films with in situ Monitoring by Spectroscopic Ellipsometry


Tsuchiya, Yoshishige, Endoh, M, Kurosawa, M, Tung, R. T, Hattori, T and Oda, S (2003) Pulsed-Source MOCVD of High-k Dielectric Thin Films with in situ Monitoring by Spectroscopic Ellipsometry. Japanese Journal of Applied Physics, 42, 1957-1961.

Download

[img] PDF
Download (221Kb)
Item Type: Article
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
Item ID: 267431
Date Deposited: 01 Jun 2009 09:11
Last Modified: 02 Mar 2012 13:43
Contributors: Tsuchiya, Yoshishige (Author)
Endoh, M (Author)
Kurosawa, M (Author)
Tung, R. T (Author)
Hattori, T (Author)
Oda, S (Author)
Date: April 2003
Status: Published
Publisher: The Japan Society of Applied Physics
Further Information:Google Scholar
ISI Citation Count:5
URI: http://eprints.soton.ac.uk/id/eprint/267431

Actions (login required)

View Item View Item
EPrints Logo
Contact ePrints Soton: eprints@soton.ac.uk
ePrints Soton supports OAI 2.0 with a base URL of http://eprints.soton.ac.uk/cgi/oai2