Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring
Tsuchiya, Yoshishige, Endoh, M and Oda, S (2003) Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring. At 2003 International Conference on Solid State Devices and Materials (SSDM2003), Tokyo, Japan, 16 - 18 Sep 2003.
Download
![[img]](http://eprints.soton.ac.uk/style/images/fileicons/application_pdf.png) |
PDF
Download (419Kb) |
| Item Type: | Conference or Workshop Item (Speech) |
|---|---|
| Additional Information: | Event Dates: 16-18 September |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 267445 |
| Date Deposited: | 01 Jun 2009 15:14 |
| Last Modified: | 02 Mar 2012 13:43 |
| Contributors: | Tsuchiya, Yoshishige (Author) Endoh, M (Author) Oda, S (Author) |
| Date: | 2003 |
| Additional Information: | Event Dates: 16-18 September |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/267445 |
Actions (login required)
 |
View Item |
